SCHOTT

AF 32® eco

AF 32® eco

With a unique range of properties, as well as semiconductor process compatibility, AF 32® eco offers a flexible option for designers. This alkali-free glass is produced using SCHOTT’s unique down-draw process, which results in a broad thickness range, excellent transmittance and a superior surface quality.

Smooth, stable and sturdy

SCHOTT AF 32® eco has a low coefficient of thermal expansion similar to a silicon wafer, making it ideally suited to wafer-level packaging in the semiconductor industry. With high thermal stability, high optical quality, excellent dielectric properties, and very low roughnesses, it fits a broad range of applications.

A wide range of tightly controlled thicknesses

SCHOTT’s unique down-draw technology enables us to manufacture products between 0.03 mm and 1.1 mm in thickness. AF 32® eco is suited to large formats such as 12” wafers. Across all these options, tight geometric tolerances mean reliable performance, whatever your field of application.

Outstanding technical properties

The superior properties of SCHOTT AF 32® eco make it highly versatile. Combining a high level of technical properties such as size, bulk and surface quality with the excellent physical and chemical properties of high optical transmission, high thermal stability, a low dielectric loss factor, and a low CTE, AF 32® eco remains effective even within demanding environments. Alkali-free and manufactured without arsenic and antimony, AF 32® eco is the go-to glass for a large number of industries.